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PLASMA SOURCES SCIENCE & TECHNOLOGY

SCI/SCIE
PLASMA SOURCES SCIENCE & TECHNOLOGY
雜志名稱:等離子體源科學與技術(shù)
簡稱:PLASMA SOURCES SCI T
期刊ISSN:0963-0252
大類研究方向:物理
影響因子:4.128
數(shù)據(jù)庫類型:SCI/SCIE
是否OA:No
出版地:ENGLAND
年文章數(shù):193
小類研究方向:物理-物理:流體與等離子體
審稿速度:約6.0個月
平均錄用比例:容易

官方網(wǎng)站:http://iopscience.iop.org/0963-0252/

投稿網(wǎng)址:http://mc04.manuscriptcentral.com/psst-iop

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PLASMA SOURCES SCIENCE & TECHNOLOGY

英文簡介

Plasma Sources Science and Technology (PSST) reports on low-temperature plasmas and ionized gases operating over all ranges of gas pressure and plasma density, with varying degrees of ionization. The emphasis of PSST is on the fundamental science of these plasmas, their sources and the physical and chemical processes initiated or sustained by them, as elucidated through theoretical, computational or experimental techniques. PSST also reports on new experimentally or theoretically derived fundamental data (e.g. cross sections, transport coefficients) required for investigation of low temperature plasmas. Reports that relate to the technology and applications of these plasmas should be closely linked to the science and fundamental processes occurring in the plasma state.

PLASMA SOURCES SCIENCE & TECHNOLOGY

中文簡介

等離子體源科學與技術(shù)(PSST)報告了低溫等離子體和電離氣體在各種氣體壓力和等離子體密度范圍內(nèi)以不同程度的電離作用運行的情況。PSST的重點是這些等離子體的基礎(chǔ)科學,它們的來源,以及通過理論、計算或?qū)嶒灱夹g(shù)闡明的由它們引發(fā)或維持的物理和化學過程。PSST還報告了研究低溫等離子體所需的新的實驗或理論推導的基本數(shù)據(jù)(例如截面、輸運系數(shù))。有關(guān)這些等離子體的技術(shù)和應(yīng)用的報道應(yīng)與等離子體狀態(tài)下發(fā)生的科學和基本過程密切相關(guān)。

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