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JOURNAL OF LASER APPLICATIONS

SCIE
JOURNAL OF LASER APPLICATIONS
雜志名稱:激光應(yīng)用雜志
簡稱:J LASER APPL
期刊ISSN:1042-346X
大類研究方向:物理
影響因子:1.443
數(shù)據(jù)庫類型:SCIE
是否OA:No
出版地:UNITED STATES
年文章數(shù):118
小類研究方向:物理-材料科學:綜合
審稿速度:>12周,或約稿
平均錄用比例:容易

官方網(wǎng)站:http://scitation.aip.org/content/lia/journal/jla

投稿網(wǎng)址:http://jla.peerx-press.org/cgi-bin/main.plex

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JOURNAL OF LASER APPLICATIONS

英文簡介

The Journal of Laser Applications (JLA) is the scientific platform of the Laser Institute of America (LIA) and is published in cooperation with AIP Publishing. The high-quality articles cover a broad range from fundamental and applied research and development to industrial applications. Therefore, JLA is a reflection of the state-of-R&D in photonic production, sensing and measurement as well as Laser safety. Due to the current grand societal challenges such as resource saving, energy, mobility, health and defense the foci and trends of applied photonics have been changing over the past years, significantly. Hence, the structure of JLA has been improved to meet these trends, yet maintaining the structure according to scientific areas of competence. The following international and well known first-class scientists serve as allocated Editors in 9 new categories:High Precision Materials Processing with Ultrafast Lasers – Andreas OstendorfLaser Additive Manufacturing – Milan BrandtHigh Power Materials Processing with High Brightness Lasers – Eckhard BeyerEmerging Applications of Laser Technologies in High-performance/Multi-function Materials and Structures – Dongdong GuSurface Modification – Minlin ZhongLasers in Nanomanufacturing / Nanophotonics & Thin Film Technology – Lan JiangSpectroscopy / Imaging / Diagnostics / Measurements – Dave FarsonLaser Systems and Markets – Klaus L?fflerMedical Applications & Safety – Dave Sliney

JOURNAL OF LASER APPLICATIONS

中文簡介

激光應(yīng)用雜志(JLA)是美國激光研究所(LIA)的科學平臺,與AIP出版社合作出版。高質(zhì)量的文章涵蓋從基礎(chǔ)和應(yīng)用的研究和開發(fā)到工業(yè)應(yīng)用的廣泛范圍。因此,JLA反映了光子生產(chǎn)、傳感和測量以及激光安全性方面的研發(fā)現(xiàn)狀。由于當前巨大的社會挑戰(zhàn),如資源節(jié)約、能源、移動、健康和國防,應(yīng)用光子學的焦點和趨勢在過去幾年發(fā)生了顯著的變化。因此,JLA的結(jié)構(gòu)已經(jīng)得到了改進,以滿足這些趨勢,同時根據(jù)科學領(lǐng)域的能力保持結(jié)構(gòu)。下列國際知名的一流科學家擔任9個新類別的編委:用超快激光加工高精度材料- Andreas Ostendorf激光增材制造——米蘭·勃蘭特高功率材料加工與高亮度激光-埃克哈德拜爾激光技術(shù)在高性能/多功能材料和結(jié)構(gòu)中的新興應(yīng)用——顧東東表面改性-鐘敏林激光在納米制造/納米光子學和薄膜技術(shù)-蘭江光譜/成像/診斷/測量- Dave Farson激光系統(tǒng)和市場-克勞斯洛夫勒醫(yī)療應(yīng)用與安全-戴夫斯利尼

JOURNAL OF LASER APPLICATIONS

中科院分區(qū)(請以最新為準)
大類學科 分區(qū) 小類學科 分區(qū) Top期刊 綜述期刊
工程技術(shù) 4區(qū) MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科學:綜合 OPTICS 光學 PHYSICS, APPLIED 物理:應(yīng)用 4區(qū) 4區(qū) 4區(qū)

JOURNAL OF LASER APPLICATIONS

JCR分區(qū)(請以最新為準)
JCR分區(qū)等級 JCR所屬學科 分區(qū) 影響因子
Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Q3 2.521
PHYSICS, APPLIED Q3
OPTICS Q3

JOURNAL OF LASER APPLICATIONS

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JOURNAL OF LASER APPLICATIONS

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